1. osnaDocs
  2. Fachbereich 06 - Mathematik / Informatik / Physik
  3. FB06 - Hochschulschriften

Real-Time Monitoring of Strain Accumulation and Relief during Epitaxy of Ultrathin Co Ferrite Films with Varied Co Content

Please use this identifier to cite or link to this item:
https://doi.org/10.48693/516
Open Access logo originally created by the Public Library of Science (PLoS)
Full metadata record
DC FieldValueLanguage
dc.creatorThien, Jannis-
dc.creatorRodewald, Jari-
dc.creatorPohlmann, Tobias-
dc.creatorRuwisch, Kevin-
dc.creatorBertram, Florian-
dc.creatorKüpper, Karsten-
dc.creatorWollschläger, Joachim-
dc.date.accessioned2024-02-28T09:35:08Z-
dc.date.available2024-02-28T09:35:08Z-
dc.date.issued2023-11-23-
dc.identifier.citationThien J, Rodewald J, Pohlmann T, Ruwisch K, Bertram F, Küpper K, Wollschläger J.: Real-Time Monitoring of Strain Accumulation and Relief during Epitaxy of Ultrathin Co Ferrite Films with Varied Co Content. Materials. 2023; 16(23):7287ger
dc.identifier.urihttps://doi.org/10.48693/516-
dc.identifier.urihttps://osnadocs.ub.uni-osnabrueck.de/handle/ds-2024022810912-
dc.description.abstractUltrathin Co𝑥Fe3−𝑥O4 films of high structural quality and with different Co content (x = 0.6–1.2) were prepared by reactive molecular beam epitaxy on MgO(001) substrates. Epitaxy of these ferrite films is extensively monitored by means of time-resolved (operando) X-ray diffraction recorded in out-of-plane geometry to characterize the temporal evolution of the film structure. The Co ferrite films show high crystalline ordering and smooth film interfaces independent of their Co content. All Co𝑥Fe3−𝑥O4 films exhibit enhanced compressive out-of-plane strain during the early stages of growth, which partly releases with increasing film thickness. When the Co content of the ferrite films increases, the vertical-layer distances increase, accompanied by slightly increasing film roughnesses. The latter result is supported by surface-sensitive low-energy electron diffraction as well as X-ray reflectivity measurements on the final films. In contrast, the substrate–film interface roughness decreases with increasing Co content, which is confirmed with X-ray reflectivity measurements. In addition, the composition and electronic structure of the ferrite films is characterized by means of hard X-ray photoelectron spectroscopy performed after film growth. The experiments reveal the expected increasing Fe3+/Fe2+ cation ratios for a higher Co content.eng
dc.relationhttps://doi.org/10.3390/ma16237287ger
dc.rightsAttribution 4.0 International*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/*
dc.subjectcobalt ferriteeng
dc.subjectultrathin filmseng
dc.subjectstraineng
dc.subjectX-ray diffractioneng
dc.subject.ddc530 - Physikger
dc.titleReal-Time Monitoring of Strain Accumulation and Relief during Epitaxy of Ultrathin Co Ferrite Films with Varied Co Contenteng
dc.typeEinzelbeitrag in einer wissenschaftlichen Zeitschrift [Article]ger
orcid.creatorhttps://orcid.org/0000-0001-5551-7240-
orcid.creatorhttps://orcid.org/0000-0002-3043-3718-
orcid.creatorhttps://orcid.org/0000-0003-0364-9385-
orcid.creatorhttps://orcid.org/0000-0001-9304-3015-
dc.identifier.doi10.3390/ma16237287-
Appears in Collections:FB06 - Hochschulschriften
Open-Access-Publikationsfonds

Files in This Item:
File Description SizeFormat 
Thien_etal_materials-16-07287_2023.pdfArticle792,46 kBAdobe PDF
Thien_etal_materials-16-07287_2023.pdf
Thumbnail
View/Open
Show simple item record


This item is licensed under a Creative Commons License Creative Commons